| 摘要: |
| 为拓宽混合微电子技术研发思路和加大其工程应用力度，综述了BiCMOS器件的发展概况、基本结构、技术特点和应用领域以及目前达到的技术水平，并简述了BiCMOS技术的典型工艺和已获得的研究成果，讨论了BiCMOS电路未来的发展趋势和市场前景。 |
| 关键词: BiCMOS器件 发展趋势 混合微电子技术 双极互补金属氧化物半导体器件 混合微电子技术 工艺结构 |
| DOI：10.3969/j.issn.1001-893X. |
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| 基金项目:江苏省高校自然科学研究基金项目(02KJB510005) |
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| Summary of BiCMOS Device Application Foreground and Development Trend |
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| Abstract: |
| To extend the way of thinking of research and development in mixed microelectronics technology and enlarge its practical applications,a summary of the BiCMOS is provided.The BiCMOS technology general development situation, basic construction, technique characteristics and its applied field with the technique level that now is attained are introduced in this paper, and typical technique, researched results, market foreground of BiCMOS and the trend of its future development are also discussed. |
| Key words: BiCMOS device,Mixed microelectronic technology,Technical configuration,Typical application,Development trend |
《电讯技术》编辑部 